The use of substrate biasing during plasma-enhanced atomic layer deposition of TiN for area-selective deposition

  • S. Vlaanderen

Scriptie/Masterproef: Master

Samenvatting

Datum prijs2019
Originele taalEngels
BegeleiderTahsin Faraz (Afstudeerdocent 1), Marc J.M. Merkx (Afstudeerdocent 2) & Adrie J.M. Mackus (Afstudeerdocent 2)

Citeer dit

The use of substrate biasing during plasma-enhanced atomic layer deposition of TiN for area-selective deposition
Vlaanderen, S. (Auteur). 2019

Scriptie/Masterproef: Master