| Datum prijs | 2019 |
|---|---|
| Originele taal | Engels |
| Begeleider | Tahsin Faraz (Afstudeerdocent 1), Marc J.M. Merkx (Afstudeerdocent 2) & Adrie J.M. Mackus (Afstudeerdocent 2) |
The use of substrate biasing during plasma-enhanced atomic layer deposition of TiN for area-selective deposition
Scriptie/Masterproef: Master