| Datum prijs | 14 aug. 2020 |
|---|---|
| Originele taal | Engels |
| Begeleider | Michael Burch (Afstudeerdocent 1), Ignacio Alonso (Externe coach), Konstantin Starkov (Externe coach), Steven van der Helm (Externe coach), Ernst W. Remij (Externe coach), Bram Schoenmakers (Externe coach) & Y. Zonneveld (Externe coach) |
Patterns & correlations in scanner data for wafer output optimization
Scriptie/Masterproef: Master