| Datum prijs | 31 dec. 2003 |
|---|---|
| Originele taal | Engels |
| Begeleider | Johan P.M. Hoefnagels (Afstudeerdocent 1), W.M.M. (Erwin) Kessels (Afstudeerdocent 2) & M.C.M. (Richard) van de Sanden (Afstudeerdocent 2) |
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New experimental setup for surface studies during silicon-based film growth: radical sources and hydrogen-induced etching experiments
Scriptie/Masterproef: Master