Area-selective atomic layer deposition of SiO2

: studied by in situ Fourier transform infrared spectroscopy and spectroscopic ellipsometry

Scriptie/masterproef: Master

Uittreksel

Datum Prijs2017
TaalEngels
BegeleiderAdrie Mackus (Afstudeerdocent 1)

Citeer dit

Area-selective atomic layer deposition of SiO2: studied by in situ Fourier transform infrared spectroscopy and spectroscopic ellipsometry
Merkx, M. J. M. (Auteur). 2017

Scriptie/masterproef: Master