Zirconia thin film preparation by wet chemical methods at low temperature

M. Popovici; J. Graaf, de; M.A. Verschuuren; P.C.J. Graat; M.A. Verheijen

doi:10.1016/j.tsf.2010.08.015

Zirconia thin film preparation by wet chemical methods at low temperature

M. Popovici, J. Graaf, de, M.A. Verschuuren, P.C.J. Graat, M.A. Verheijen

Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review

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In this study the preparation of zirconia thin films with a high refractive index at low temperature is aimed for. Two non-hydrolytic type approaches of wet chemical synthesis are presented. Both by sol–gel and colloid chemistry, highly transmissive, smooth thin films of zirconia cubic and/or tetragonal crystalline phases were readily prepared after annealing at only 400 °C. The thin films show indices of refraction varying between 1.7 and 1.9 for annealing temperatures in the range 200–400 °C.

Originele taal-2	Engels
Pagina's (van-tot)	630-634
Aantal pagina's	5
Tijdschrift	Thin Solid Films
Volume	519
Nummer van het tijdschrift	2
DOI's	https://doi.org/10.1016/j.tsf.2010.08.015
Status	Gepubliceerd - 2010

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10.1016/j.tsf.2010.08.015

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abstract = "In this study the preparation of zirconia thin films with a high refractive index at low temperature is aimed for. Two non-hydrolytic type approaches of wet chemical synthesis are presented. Both by sol–gel and colloid chemistry, highly transmissive, smooth thin films of zirconia cubic and/or tetragonal crystalline phases were readily prepared after annealing at only 400 °C. The thin films show indices of refraction varying between 1.7 and 1.9 for annealing temperatures in the range 200–400 °C.",

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AU - Graat, P.C.J.

AU - Verheijen, M.A.

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AB - In this study the preparation of zirconia thin films with a high refractive index at low temperature is aimed for. Two non-hydrolytic type approaches of wet chemical synthesis are presented. Both by sol–gel and colloid chemistry, highly transmissive, smooth thin films of zirconia cubic and/or tetragonal crystalline phases were readily prepared after annealing at only 400 °C. The thin films show indices of refraction varying between 1.7 and 1.9 for annealing temperatures in the range 200–400 °C.

U2 - 10.1016/j.tsf.2010.08.015

DO - 10.1016/j.tsf.2010.08.015

M3 - Article

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