Vibrational population of hydrogen molecules excited by an RF discharge in an expanding thermal arc plasma as determined by emssion spectroscopy

D.K. Otorbaev; M.J. Graaf, de; M.C.M. Sanden, van de; D.C. Schram

doi:10.1002/ctpp.2150350303

Vibrational population of hydrogen molecules excited by an RF discharge in an expanding thermal arc plasma as determined by emssion spectroscopy

D.K. Otorbaev
, M.J. Graaf, de
, M.C.M. Sanden, van de
, D.C. Schram

Plasma & Materials Processing

Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review

7 Citaten (Scopus)

191 Downloads (Pure)

Originele taal-2	Engels
Pagina's (van-tot)	195-202
Tijdschrift	Contributions to Plasma Physics
Volume	35
Nummer van het tijdschrift	3
DOI's	https://doi.org/10.1002/ctpp.2150350303
Status	Gepubliceerd - 1995

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title = "Vibrational population of hydrogen molecules excited by an RF discharge in an expanding thermal arc plasma as determined by emssion spectroscopy",

author = "D.K. Otorbaev and \{Graaf, de\}, M.J. and \{Sanden, van de\}, M.C.M. and D.C. Schram",

year = "1995",

doi = "10.1002/ctpp.2150350303",

language = "English",

volume = "35",

pages = "195--202",

journal = "Contributions to Plasma Physics",

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Vibrational population of hydrogen molecules excited by an RF discharge in an expanding thermal arc plasma as determined by emssion spectroscopy. / Otorbaev, D.K.; Graaf, de, M.J.; Sanden, van de, M.C.M. et al.
In: Contributions to Plasma Physics, Vol. 35, Nr. 3, 1995, blz. 195-202.

Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review

TY - JOUR

T1 - Vibrational population of hydrogen molecules excited by an RF discharge in an expanding thermal arc plasma as determined by emssion spectroscopy

AU - Otorbaev, D.K.

AU - Graaf, de, M.J.

AU - Sanden, van de, M.C.M.

AU - Schram, D.C.

PY - 1995

Y1 - 1995

U2 - 10.1002/ctpp.2150350303

DO - 10.1002/ctpp.2150350303

M3 - Article

SN - 0863-1042

VL - 35

SP - 195

EP - 202

JO - Contributions to Plasma Physics

JF - Contributions to Plasma Physics

IS - 3

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