Uniform large-area slot-die coating of soluble metal oxide semiconductor towards mass production of high-performance TFT backplanes

Jan Laurens van der Steen, Gerwin Gelinck, Ryo Takata, Marko Marinkovic, Anita Neumann, Duy Vu Pham, Ralf Anselmann, Tung Huei Ke, Steve Smout, Sarah Schols

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

Samenvatting

ESL TFT backplane with solution type metal oxide semiconductor was completely processed on mass-production ready equipment. High mobility TFTs with excellent uniformity were obtained over the complete Gen1 glass substrate (320 mm x 352 mm), with good TFT bias stress reliability. An 85 ppi QVGA AMOLED display is demonstrated.

Originele taal-2Engels
Titel23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016
UitgeverijSociety for Information Display
Pagina's844-847
Aantal pagina's4
Volume2
ISBN van elektronische versie9781510845510
StatusGepubliceerd - 1 jan 2016
Evenement23rd International Display Workshops in conjunction with Asia Display (IDW 2016) - Fukuoka, Japan
Duur: 7 dec 20169 dec 2016
Congresnummer: 23

Congres

Congres23rd International Display Workshops in conjunction with Asia Display (IDW 2016)
Verkorte titelIDW 2016
Land/RegioJapan
StadFukuoka
Periode7/12/169/12/16

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