Uniform large-area slot-die coating of soluble metal oxide semiconductor towards mass production of high-performance TFT backplanes

Ilias Katsouras, Joris Maas, Jan Laurens van der Steen, Gerwin Gelinck, Ryo Takata, Marko Marinkovic, Anita Neumann, Duy Vu Pham, Ralf Anselmann, Tung Huei Ke, Steve Smout, Sarah Schols

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

Samenvatting

ESL TFT backplane with solution type metal oxide semiconductor was completely processed on mass-production ready equipment. High mobility TFTs with excellent uniformity were obtained over the complete Gen1 glass substrate (320 mm × 352 mm), with good TFT bias stress reliability. An 85 ppi QVGA AMOLED display is demonstrated.

Originele taal-2Engels
Titel23rd International Display Workshops in conjunction with Asia Display, IDW/AD 2016
UitgeverijSociety for Information Display
Pagina's81-84
Aantal pagina's4
Volume1
ISBN van elektronische versie9781510845510
StatusGepubliceerd - 1 jan. 2016
Evenement23rd International Display Workshops in conjunction with Asia Display (IDW 2016) - Fukuoka, Japan
Duur: 7 dec. 20169 dec. 2016
Congresnummer: 23

Congres

Congres23rd International Display Workshops in conjunction with Asia Display (IDW 2016)
Verkorte titelIDW 2016
Land/RegioJapan
StadFukuoka
Periode7/12/169/12/16

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