Ultra-thin aluminium oxide films deposited by plasma-enhanced atomic layer deposition for corrosion protection

S.E. Potts, L. Schmalz, M. Fenker, B. Díaz, J. Swiatowska, V. Maurice, A. Seyeux, P. Marcus, G. Radnóczi, L. Tóth, W.M.M. Kessels

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

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Samenvatting

We have employed plasma-enhanced and thermal atomic layer deposition (ALD) within the temperature range of 50–150°C for the deposition of ultra-thin (10–50 nm) Al2O3 films on 100Cr6 steel and aluminium Al2024-T3 alloys. [Al(CH3)3] was used as the precursor with either an O2 plasma or water as co-reactants. Neutral salt spray tests showed that the thicker films offered the best corrosion-resistance. Using cyclic voltametry, the 50 nm films were found to be the least porous (
Originele taal-2Engels
Pagina's (van-tot)C132-C138
Aantal pagina's7
TijdschriftJournal of the Electrochemical Society
Volume158
Nummer van het tijdschrift5
DOI's
StatusGepubliceerd - 2011

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