Tuning the cloud point of methacrylic acid and oligoethyleneglycol methacrylate based random copolymers

C.R. Becer; R. Hoogenboom; S. Hahn; U.S. Schubert

Tuning the cloud point of methacrylic acid and oligoethyleneglycol methacrylate based random copolymers

C.R. Becer, R. Hoogenboom, S. Hahn, U.S. Schubert

Chemical Engineering and Chemistry

Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic

Samenvatting

Well-defined copolymers based on methacrylic acid and low-mol.-wt. polyethylene glycol methacrylate Me ether were prepd. via RAFT polymn. It was possible to tune the cloud point of the polymers simply by chaning the content of the two monomers in the copolymer. [on SciFinder (R)]

Originele taal-2	Engels
Pagina's (van-tot)	1095-1096
Tijdschrift	Polymer Preprints
Volume	49
Nummer van het tijdschrift	1
Status	Gepubliceerd - 2008

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Citeer dit

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abstract = "Well-defined copolymers based on methacrylic acid and low-mol.-wt. polyethylene glycol methacrylate Me ether were prepd. via RAFT polymn. It was possible to tune the cloud point of the polymers simply by chaning the content of the two monomers in the copolymer. [on SciFinder (R)]",

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AU - Hoogenboom, R.

AU - Hahn, S.

AU - Schubert, U.S.

PY - 2008

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AB - Well-defined copolymers based on methacrylic acid and low-mol.-wt. polyethylene glycol methacrylate Me ether were prepd. via RAFT polymn. It was possible to tune the cloud point of the polymers simply by chaning the content of the two monomers in the copolymer. [on SciFinder (R)]

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JF - Polymer Preprints

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