Transport of atomic radicals in expanding plasmas : a laser spectroscopy study

S. Mazouffre, R.A.H. Engeln, M.G.H. Boogaarts, J.J.A.M. Mullen, van der, D.C. Schram

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademic

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The transport mechanisms of radicals (H and D) and neutrals (Ar) in plasma expansions have been studied by means of laser-based diagnostic techniques: TALIF, LIF and UV Rayleigh scattering. The flow of radicals does not fulfill the well-established free-jet shock wave picture. H(D) atoms escape the supersonic domain of the plasma jet. This outward diffusion process is driven by the huge d. gradients induced in the background by wall-recombination. For the first time it is clearly shown that processes at surfaces can strongly influence the radical flow pattern. [on SciFinder (R)]
Originele taal-2Engels
TitelProgress in Plasma Processing of Materials 2001, Proceedings of the European Conference on Thermal Plasma Processes, 6th, Strasbourg, France, May 30-June 3, 2000
RedacteurenP. Fauchais
Plaats van productieNew York
UitgeverijBegell House Inc.
Pagina's83-88
ISBN van geprinte versie1-567-00165-3
StatusGepubliceerd - 2001
Evenementconference; TPP ; 6 : European Conference on Thermal Plasma Processes ; 6 (Strasbourg) : 2000.05.30-06.03 -
Duur: 1 jan 2001 → …

Congres

Congresconference; TPP ; 6 : European Conference on Thermal Plasma Processes ; 6 (Strasbourg) : 2000.05.30-06.03
Periode1/01/01 → …
AnderTPP ; 6 : European Conference on Thermal Plasma Processes ; 6 (Strasbourg) : 2000.05.30-06.03

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