Thermal discharges: experiments and diagnostics

D.C. Schram, D.A. Benoij, J.J. Beulens, F.H.A.G. Fey, M.J. Graaf, de, G.J. Meeusen, R.F.G. Meulenbroeks, J.J.A.M. Mullen, van der, J.M. Regt, de, M.C.M. Sanden, van de, Z. Qing

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Samenvatting

In plasma processing commonly a distinction is made between low pressure (or low (ion) temperature) plasmas and thermal plasmas1. The transition between these two classes is gradual. Plasmas cover a wide spectrum in electron density(10 15/m3 — 10 23/m3) and ionization degree (10-7—1). In low pressure plasmas2 as RF—discharges the ionization degree is usually small and these plasmas are characterized by an abundance of molecular fragments and large ambipolar fields. The high electron density thermal plasmas have a high ionization degree and nearly full dissociation and a high heavy particle temperature. In this paper we will focuss on these plasmas.
Originele taal-2Engels
TitelMicrowave Discharges: Fundamentals and Applications
RedacteurenC.M. Ferreira, M. Moisan
Plaats van productieLondon
UitgeverijPlenum Press
Pagina's247-267
ISBN van geprinte versie0-306-44355-4
StatusGepubliceerd - 1993

Publicatie series

NaamNATO ASI series. Series B: Physics
Volume302
ISSN van geprinte versie0258-1221

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