The Simulation of a Diamond Oxy-Acetylene Combustion Torch Reactor with a Reduced Gas-Phase and Surface Mechanism

M. Okkerse; R.J.H. Klein-Douwel; M.H.J.M. Croon, de; C.R. Kleijn; J.J. Meulen, ter; G.B.M.M. Marin; H.E.A. van den Akker

The Simulation of a Diamond Oxy-Acetylene Combustion Torch Reactor with a Reduced Gas-Phase and Surface Mechanism

M. Okkerse, R.J.H. Klein-Douwel, M.H.J.M. Croon, de, C.R. Kleijn, J.J. Meulen, ter, G.B.M.M. Marin, H.E.A. van den Akker

Chemical Reactor Engineering

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

Originele taal-2	Engels
Titel	Chemical Vapour Deposition, Proc. XIVth Int. Conf. and EUROCVD-11
Redacteuren	M.D. Allendorf
Uitgeverij	Electrochemical Society, Inc.
Pagina's	163-170
ISBN van geprinte versie	1566771781
Status	Gepubliceerd - 1997

Citeer dit

Okkerse, M., Klein-Douwel, R. J. H., Croon, de, M. H. J. M., Kleijn, C. R., Meulen, ter, J. J., Marin, G. B. M. M., & van den Akker, H. E. A. (1997). The Simulation of a Diamond Oxy-Acetylene Combustion Torch Reactor with a Reduced Gas-Phase and Surface Mechanism. In M. D. Allendorf (editor), Chemical Vapour Deposition, Proc. XIVth Int. Conf. and EUROCVD-11 (blz. 163-170). Electrochemical Society, Inc..

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title = "The Simulation of a Diamond Oxy-Acetylene Combustion Torch Reactor with a Reduced Gas-Phase and Surface Mechanism",

author = "M. Okkerse and R.J.H. Klein-Douwel and {Croon, de}, M.H.J.M. and C.R. Kleijn and {Meulen, ter}, J.J. and G.B.M.M. Marin and {van den Akker}, H.E.A.",

year = "1997",

language = "English",

isbn = "1566771781",

pages = "163--170",

editor = "M.D. Allendorf",

booktitle = "Chemical Vapour Deposition, Proc. XIVth Int. Conf. and EUROCVD-11",

publisher = "Electrochemical Society, Inc.",

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Okkerse, M, Klein-Douwel, RJH, Croon, de, MHJM, Kleijn, CR, Meulen, ter, JJ, Marin, GBMM & van den Akker, HEA 1997, The Simulation of a Diamond Oxy-Acetylene Combustion Torch Reactor with a Reduced Gas-Phase and Surface Mechanism. in MD Allendorf (redactie), Chemical Vapour Deposition, Proc. XIVth Int. Conf. and EUROCVD-11. Electrochemical Society, Inc., blz. 163-170.

The Simulation of a Diamond Oxy-Acetylene Combustion Torch Reactor with a Reduced Gas-Phase and Surface Mechanism. / Okkerse, M.; Klein-Douwel, R.J.H.; Croon, de, M.H.J.M. et al.

Chemical Vapour Deposition, Proc. XIVth Int. Conf. and EUROCVD-11. redactie / M.D. Allendorf. Electrochemical Society, Inc., 1997. blz. 163-170.

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

TY - GEN

T1 - The Simulation of a Diamond Oxy-Acetylene Combustion Torch Reactor with a Reduced Gas-Phase and Surface Mechanism

AU - Okkerse, M.

AU - Klein-Douwel, R.J.H.

AU - Croon, de, M.H.J.M.

AU - Kleijn, C.R.

AU - Meulen, ter, J.J.

AU - Marin, G.B.M.M.

AU - van den Akker, H.E.A.

PY - 1997

Y1 - 1997

M3 - Conference contribution

SN - 1566771781

SP - 163

EP - 170

BT - Chemical Vapour Deposition, Proc. XIVth Int. Conf. and EUROCVD-11

A2 - Allendorf, M.D.

PB - Electrochemical Society, Inc.

ER -