The plasma charging of deposited particles

L.C.J. Heijmans; S. Nijdam

The plasma charging of deposited particles

L.C.J. Heijmans, S. Nijdam

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Samenvatting

It is general knowledge that a substrate will charge to the floating potential when a plasma is applied over it. This potential is such, that there is a balance between the electron and ion flux towards it. Likewise any particle on said substrate will be charged. We show that this particle can gain a much higher surface charge density than the substrate due to its height. The charge is in the same order of magnitude as when the particle would be in the plasma bulk.

Originele taal-2	Engels
Status	Gepubliceerd - jul. 2016
Evenement	23rd Europhysics Conference on Atomic and Molecular Physics on Ionized Gases ESCAMPIG XXIII, July 12-16, Bratislava, Slovakia - Bratislava, Slovakije Duur: 12 jul. 2016 → 16 jul. 2016 https://www.escampig2016.org/

Congres

Congres	23rd Europhysics Conference on Atomic and Molecular Physics on Ionized Gases ESCAMPIG XXIII, July 12-16, Bratislava, Slovakia
Verkorte titel	ESCAMPIG2016
Land/Regio	Slovakije
Stad	Bratislava
Periode	12/07/16 → 16/07/16
Internet adres	https://www.escampig2016.org/

Bibliografische nota

ESCAMPIG XXIII, Bratislava, Slovakia, July 12-16, 2016

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AU - Heijmans, L.C.J.

AU - Nijdam, S.

N1 - ESCAMPIG XXIII, Bratislava, Slovakia, July 12-16, 2016

PY - 2016/7

Y1 - 2016/7

N2 - It is general knowledge that a substrate will charge to the floating potential when a plasma is applied over it. This potential is such, that there is a balance between the electron and ion flux towards it. Likewise any particle on said substrate will be charged. We show that this particle can gain a much higher surface charge density than the substrate due to its height. The charge is in the same order of magnitude as when the particle would be in the plasma bulk.

AB - It is general knowledge that a substrate will charge to the floating potential when a plasma is applied over it. This potential is such, that there is a balance between the electron and ion flux towards it. Likewise any particle on said substrate will be charged. We show that this particle can gain a much higher surface charge density than the substrate due to its height. The charge is in the same order of magnitude as when the particle would be in the plasma bulk.

M3 - Poster

T2 - 23rd Europhysics Conference on Atomic and Molecular Physics on Ionized Gases ESCAMPIG XXIII, July 12-16, Bratislava, Slovakia

Y2 - 12 July 2016 through 16 July 2016

ER -

The plasma charging of deposited particles

Samenvatting

Congres

Bibliografische nota

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