It is general knowledge that a substrate will charge to the floating potential when a plasma is applied over it. This potential is such, that there is a balance between the electron and ion flux towards it. Likewise any particle on said substrate will be charged. We show that this particle can gain a much higher surface charge density than the substrate due to its height. The charge is in the same order of magnitude as when the particle would be in the plasma bulk.
|Status||Gepubliceerd - jul. 2016|
|Evenement||23rd Europhysics Conference on Atomic and Molecular Physics on Ionized Gases ESCAMPIG XXIII, July 12-16, Bratislava, Slovakia - Bratislava, Slovakije|
Duur: 12 jul. 2016 → 16 jul. 2016
|Congres||23rd Europhysics Conference on Atomic and Molecular Physics on Ionized Gases ESCAMPIG XXIII, July 12-16, Bratislava, Slovakia|
|Periode||12/07/16 → 16/07/16|