The plasma charging of deposited particles

L.C.J. Heijmans, S. Nijdam

Onderzoeksoutput: Bijdrage aan congresPosterAcademic

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Samenvatting

It is general knowledge that a substrate will charge to the floating potential when a plasma is applied over it. This potential is such, that there is a balance between the electron and ion flux towards it. Likewise any particle on said substrate will be charged. We show that this particle can gain a much higher surface charge density than the substrate due to its height. The charge is in the same order of magnitude as when the particle would be in the plasma bulk.
Originele taal-2Engels
StatusGepubliceerd - jul 2016
Evenement23rd Europhysics Conference on Atomic and Molecular Physics on Ionized Gases ESCAMPIG XXIII, July 12-16, Bratislava, Slovakia - Bratislava, Slovakije
Duur: 12 jul 201616 jul 2016
https://www.escampig2016.org/

Congres

Congres23rd Europhysics Conference on Atomic and Molecular Physics on Ionized Gases ESCAMPIG XXIII, July 12-16, Bratislava, Slovakia
Verkorte titelESCAMPIG2016
LandSlovakije
StadBratislava
Periode12/07/1616/07/16
Internet adres

Bibliografische nota

ESCAMPIG XXIII, Bratislava, Slovakia, July 12-16, 2016

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