The influence of a Si-doped layer in an AlGaAs/GaAs heterostructure on the damage introduced by CH4/H2/Ar ECR plasma etching

J.G. Hassel, van, C.M. Es, van, P.A.M. Nouwens, J.H. Maahury, J.S. Wellen

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureHoofdstukAcademic

Originele taal-2Engels
TitelSemiconductor and Integrated Optoelectronics Conference, SIOE '95
StatusGepubliceerd - 1995
Evenement1995 Conference on Semiconductor and Integrated OptoElectronics (SIOE '95), March 1995, Cardiff, UK - Cardiff, Verenigd Koninkrijk
Duur: 1 mrt. 1995 → …

Congres

Congres1995 Conference on Semiconductor and Integrated OptoElectronics (SIOE '95), March 1995, Cardiff, UK
Verkorte titelSIOE '95
Land/RegioVerenigd Koninkrijk
StadCardiff
Periode1/03/95 → …
AnderSemiconductor and Integrated Optoelectronics Conference, SIOE '95, Cardiff, UK, March 1995

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