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The dissociation kinetics of NO on Rh(111) as studied by temperature programmed static secondary ion mass spectrometry and desorption

  • H.J. Borg
  • , J.F.C.-J.M. Reijerse
  • , R.A. Santen, van
  • , J.W. Niemantsverdriet

    Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

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    Samenvatting

    Temperature programmed static secondary ion mass spectrometry (TPSSIMS) and temperature programmed desorption (TPD) have been used to study the kinetics of adsorption, dissociation, and desorption of NO on Rh(111). At 100 K, NO adsorption is molecular and proceeds via mobile precursor state kinetics with a high initial sticking probability. SSIMS indicates the presence of two distinct NO adsorption states, indicative of threefold adsorption at low coverage, and occupation of bridge sites at higher coverages. Three characteristic coverage regimes appear with respect to NO dissociation. At low coverages NO
    Originele taal-2Engels
    Pagina's (van-tot)10052-10063
    Aantal pagina's12
    TijdschriftJournal of Chemical Physics
    Volume101
    Nummer van het tijdschrift11
    DOI's
    StatusGepubliceerd - 1994

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