The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth

W.M.M. Kessels; Y. Barrell; P.J. Oever, van den; J.P.M. Hoefnagels; M.C.M. Sanden, van de

The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth

W.M.M. Kessels, Y. Barrell, P.J. Oever, van den, J.P.M. Hoefnagels, M.C.M. Sanden, van de

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic

Originele taal-2	Engels
Titel	Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]
Plaats van productie	Warrendale
Uitgeverij	Materials Research Society
Pagina's	431-436
ISBN van geprinte versie	1-558-99699-0
Status	Gepubliceerd - 2003

Publicatie series

Naam	Materials Research Society symposium proceedings
Volume	762

Citeer dit

Kessels, W. M. M., Barrell, Y., Oever, van den, P. J., Hoefnagels, J. P. M., & Sanden, van de, M. C. M. (2003). The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth. In Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.] (blz. 431-436). (Materials Research Society symposium proceedings; Vol. 762). Materials Research Society.

Kessels, W.M.M. ; Barrell, Y. ; Oever, van den, P.J. et al. / The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth. Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]. Warrendale : Materials Research Society, 2003. blz. 431-436 (Materials Research Society symposium proceedings).

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title = "The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth",

author = "W.M.M. Kessels and Y. Barrell and {Oever, van den}, P.J. and J.P.M. Hoefnagels and {Sanden, van de}, M.C.M.",

year = "2003",

language = "English",

isbn = "1-558-99699-0",

series = "Materials Research Society symposium proceedings",

publisher = "Materials Research Society",

pages = "431--436",

booktitle = "Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]",

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Kessels, WMM, Barrell, Y, Oever, van den, PJ, Hoefnagels, JPM & Sanden, van de, MCM 2003, The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth. in Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]. Materials Research Society symposium proceedings, vol. 762, Materials Research Society, Warrendale, blz. 431-436.

The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth. / Kessels, W.M.M.; Barrell, Y.; Oever, van den, P.J. et al.
Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]. Warrendale: Materials Research Society, 2003. blz. 431-436 (Materials Research Society symposium proceedings; Vol. 762).

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic

TY - GEN

T1 - The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth

AU - Kessels, W.M.M.

AU - Barrell, Y.

AU - Oever, van den, P.J.

AU - Hoefnagels, J.P.M.

AU - Sanden, van de, M.C.M.

PY - 2003

Y1 - 2003

M3 - Conference contribution

SN - 1-558-99699-0

T3 - Materials Research Society symposium proceedings

SP - 431

EP - 436

BT - Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]

PB - Materials Research Society

CY - Warrendale

ER -

Kessels WMM, Barrell Y, Oever, van den PJ, Hoefnagels JPM , Sanden, van de MCM. The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth. In Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]. Warrendale: Materials Research Society. 2003. blz. 431-436. (Materials Research Society symposium proceedings).