Mesoporous silica films with a thickness of 500–900 nm were synthesized on a titanium substrate by the evaporation-induced self-assembly method (with 900–1200 rpm for 90 s) using cetyltrimethylammonium bromide (CTAB) as structure-directing agent and tetraethyl orthosilicate as the silica source. Prior to coating deposition, the titanium substrate was oxidized to increase the surface roughness up to 500 nm and to produce a thin titania layer. Just before the synthesis, the titania layer was made super hydrophilic by an UV treatment for 2 h to provide a better adhesion of the silica film to the substrate. Films with hexagonal and cubic mesostructures with a uniform pore size of 2.8 nm and a surface area of 1080 m2/g were obtained and characterized by different methods. An alternative approach for surfactant removal by gradual heating up to 250 °C in vacuum was applied. Complete removal of CTAB from the as-synthesized silica films was confirmed by infrared spectroscopy.