Synergistic etch rates during low-energetic plasma etching for hydrogenated amorphous carbon

T.A.R. Hansen, J.W. Weber, P.G.J. Colsters, D.M.H.G. Mestrom, M.C.M. Sanden, van de, R.A.H. Engeln

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Uittreksel

The etch mechanisms of hydrogenated amorphous carbon thin films in low-energetic (
Originele taal-2Engels
Artikelnummer013302
Pagina's (van-tot)013302-1/12
Aantal pagina's12
TijdschriftJournal of Applied Physics
Volume112
Nummer van het tijdschrift1
DOI's
StatusGepubliceerd - 2012

Vingerafdruk

plasma etching
carbon
thin films

Citeer dit

Hansen, T.A.R. ; Weber, J.W. ; Colsters, P.G.J. ; Mestrom, D.M.H.G. ; Sanden, van de, M.C.M. ; Engeln, R.A.H. / Synergistic etch rates during low-energetic plasma etching for hydrogenated amorphous carbon. In: Journal of Applied Physics. 2012 ; Vol. 112, Nr. 1. blz. 013302-1/12.
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title = "Synergistic etch rates during low-energetic plasma etching for hydrogenated amorphous carbon",
abstract = "The etch mechanisms of hydrogenated amorphous carbon thin films in low-energetic (",
author = "T.A.R. Hansen and J.W. Weber and P.G.J. Colsters and D.M.H.G. Mestrom and {Sanden, van de}, M.C.M. and R.A.H. Engeln",
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Synergistic etch rates during low-energetic plasma etching for hydrogenated amorphous carbon. / Hansen, T.A.R.; Weber, J.W.; Colsters, P.G.J.; Mestrom, D.M.H.G.; Sanden, van de, M.C.M.; Engeln, R.A.H.

In: Journal of Applied Physics, Vol. 112, Nr. 1, 013302, 2012, blz. 013302-1/12.

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

TY - JOUR

T1 - Synergistic etch rates during low-energetic plasma etching for hydrogenated amorphous carbon

AU - Hansen, T.A.R.

AU - Weber, J.W.

AU - Colsters, P.G.J.

AU - Mestrom, D.M.H.G.

AU - Sanden, van de, M.C.M.

AU - Engeln, R.A.H.

PY - 2012

Y1 - 2012

N2 - The etch mechanisms of hydrogenated amorphous carbon thin films in low-energetic (

AB - The etch mechanisms of hydrogenated amorphous carbon thin films in low-energetic (

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DO - 10.1063/1.4730924

M3 - Article

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SP - 013302-1/12

JO - Journal of Applied Physics

JF - Journal of Applied Physics

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