Synchronizing decentralized control loops for overall performance enhancement : a Youla framework applied to a wafer scanner

E. Evers, M.M.J. van de Wal, T.A.E. Oomen

Onderzoeksoutput: Bijdrage aan tijdschriftCongresartikelAcademicpeer review

3 Citaten (Scopus)
106 Downloads (Pure)

Samenvatting

Manufacturing equipment often consists of multiple subsystems. For instance, in lithographic IC manufacturing, both a reticle stage and a wafer stage move synchronously. Traditionally, these subsystems are divided into manageable subproblems, at the expense of a suboptimal overall solution. The aim of this paper is to develop a framework for overall system performance improvement. The method pursued in this paper builds on traditional designs, and extends these through a bi-directional controller coupling. The aim here is to optimize a criterion that speciés overall system performance. To achieve this, a new parameterization that relates to the Youla parameterization is developed that connects the bi-directional controller parameter affinely to the overall control criterion, which enables a systematic design. The performance improvement is confirmed in a case study using measured data from an industrial wafer scanner.
Originele taal-2Engels
Pagina's (van-tot)10845-10850
Aantal pagina's6
TijdschriftIFAC-PapersOnLine
Volume50
Nummer van het tijdschrift1
DOI's
StatusGepubliceerd - 18 okt 2017
Evenement20th World Congress of the International Federation of Automatic Control (IFAC 2017 World Congress) - Toulouse, Frankrijk
Duur: 9 jul 201714 jul 2017
Congresnummer: 20
https://www.ifac2017.org/

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