Surface roughness in XeF2 etching of a-Si/c-Si(100). [Erratum to document cited in CA143:121009]

A.A.E. Stevens; H.C.W. Beijerinck

doi:10.1116/1.2209658

Surface roughness in XeF2 etching of a-Si/c-Si(100). [Erratum to document cited in CA143:121009]

A.A.E. Stevens
, H.C.W. Beijerinck

Coherence and Quantum Technology

Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review

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On page 134, Figure 16 is incorrect; the correct version of the figure is given. Abstract not available.

Originele taal-2	Engels
Pagina's (van-tot)	1151-1151
Tijdschrift	Journal of Vacuum Science and Technology A
Volume	24
Nummer van het tijdschrift	4
DOI's	https://doi.org/10.1116/1.2209658
Status	Gepubliceerd - 2006

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Surface roughness in XeF2 etching of a-Si/c-Si(100). [Erratum to document cited in CA143:121009]

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