Sub-5 nm patterning by directed self-assembly of oligo(Dimethylsiloxane) liquid crystal thin films

K. Nickmans; J.N. Murphy; S.A.J. de Waal; P. Leclere; J. Doise; R. Gronheid; D.J. Broer; A.P.H.J. Schenning

doi:10.1002/adma.201602891

Sub-5 nm patterning by directed self-assembly of oligo(Dimethylsiloxane) liquid crystal thin films

K. Nickmans, J.N. Murphy, S.A.J. de Waal, P. Leclere, J. Doise, R. Gronheid, D.J. Broer, A.P.H.J. Schenning

Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review

65 Citaten (Scopus)

275 Downloads (Pure)

Originele taal-2	Engels
Pagina's (van-tot)	10068-10072
Aantal pagina's	5
Tijdschrift	Advanced Materials
Volume	28
Nummer van het tijdschrift	45
DOI's	https://doi.org/10.1002/adma.201602891
Status	Gepubliceerd - 7 dec. 2016

Toegang tot document

10.1002/adma.201602891

publisher versionDefinitieve gepubliceerde versie, 2,01 MB

Andere bestanden en links

Link to publication in Scopus

Citeer dit

@article{8c5041f625164a6db0a70276eb6faa0e,

title = "Sub-5 nm patterning by directed self-assembly of oligo(Dimethylsiloxane) liquid crystal thin films",

keywords = "directed self-assembly, graphoepitaxy, high-χ low-N, liquid crystals, nanolithography, nanopatterning, oligo(dimethylsiloxane)",

author = "K. Nickmans and J.N. Murphy and {de Waal}, S.A.J. and P. Leclere and J. Doise and R. Gronheid and D.J. Broer and A.P.H.J. Schenning",

year = "2016",

month = dec,

day = "7",

doi = "10.1002/adma.201602891",

language = "English",

volume = "28",

pages = "10068--10072",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

number = "45",

}

TY - JOUR

T1 - Sub-5 nm patterning by directed self-assembly of oligo(Dimethylsiloxane) liquid crystal thin films

AU - Nickmans, K.

AU - Murphy, J.N.

AU - de Waal, S.A.J.

AU - Leclere, P.

AU - Doise, J.

AU - Gronheid, R.

AU - Broer, D.J.

AU - Schenning, A.P.H.J.

PY - 2016/12/7

Y1 - 2016/12/7

KW - directed self-assembly

KW - graphoepitaxy

KW - high-χ low-N

KW - liquid crystals

KW - nanolithography

KW - nanopatterning

KW - oligo(dimethylsiloxane)

UR - http://www.scopus.com/inward/record.url?scp=84990049621&partnerID=8YFLogxK

U2 - 10.1002/adma.201602891

DO - 10.1002/adma.201602891

M3 - Article

C2 - 27689779

AN - SCOPUS:84990049621

SN - 0935-9648

VL - 28

SP - 10068

EP - 10072

JO - Advanced Materials

JF - Advanced Materials

IS - 45

ER -