Study of temperature programmed desorption of silicon nitride and sialon by means of mass spectrometry

Chen Mingyuan, J.W.T. Rutten, van, R. Metselaar

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Temperature programmed desorption (TPD) by means of mass spectrometry was used to study the species, adsorbed on the surface of silicon nitride powders made ln dlfferent ways and ß-sialo n made in this laboratory. Several methods were used to treat the powders. The results indicate that the main specles des orbed are NH3, NH2, H2 N2 and H2O which are adsorbed at sites with different binding energies. Treatment wlth water and propanol can't remove the adsorbed species effectively. Heating in vacuum removes the adsorbed specles completely. Heatlng ln nitrogen removes most of the adsorbed species. A mechanism about adsorption and desorption is proposed to explaln the phenomena.
Originele taal-2Engels
TitelThird EURO-Ceramics : vol. 1 : Proceedings of ceramics : Proceedings of the third European Ceramic Society Conference (THIRD ECerS), held on 12-17 September 1993 at the Madrid Congress & Exhibition Centre, Spain
RedacteurenP. Durán, J.F. Fernández
Plaats van productieCastellón de la Plana
UitgeverijFaenza Editrice Iberica
Pagina's597-602
ISBN van geprinte versie84-87683-05-3
StatusGepubliceerd - 1993

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Mingyuan, C., Rutten, van, J. W. T., & Metselaar, R. (1993). Study of temperature programmed desorption of silicon nitride and sialon by means of mass spectrometry. In P. Durán, & J. F. Fernández (editors), Third EURO-Ceramics : vol. 1 : Proceedings of ceramics : Proceedings of the third European Ceramic Society Conference (THIRD ECerS), held on 12-17 September 1993 at the Madrid Congress & Exhibition Centre, Spain (blz. 597-602). Castellón de la Plana: Faenza Editrice Iberica.