Spatial atmospheric ALD of functional layers for CIGS Solar Cells

A. Illiberi, C. Frijters, J. E. Balder, P. Poodt, F. Roozeboom

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

8 Citaten (Scopus)
2 Downloads (Pure)

Samenvatting

Spatial Atmospheric Atomic Layer Deposition combines the advantages of temporal ALD, i.e. excellent control of film composition and uniformity over large area substrates, with high growth rates (up to nm/s). In this paper we present a short overview of our research activity carried out on S-ALD of functional thin films for the front window of copper indium gallium di-selenide (CIGS) solar cells. Zn(O,S) and ZnO:Al are grown by co-injecting the vaporized precursors of the cationic (O, S) and anionic (Zn, Al) elements, respectively. An insight on the growth characteristics and properties of Zn(O,S) and ZnO:Al is presented.

Originele taal-2Engels
TitelAtomic Layer Deposition Applications 11
UitgeverijElectrochemical Society, Inc.
Pagina's31-37
Aantal pagina's7
Volume69
Uitgave7
ISBN van elektronische versie9781607685395
DOI's
StatusGepubliceerd - 2015
EvenementSymposium on Atomic Layer Deposition Applications 11 - Phoenix, Verenigde Staten van Amerika
Duur: 13 okt 201515 okt 2015

Publicatie series

NaamECS Transactions
Volume69
ISSN van geprinte versie1938-6737

Congres

CongresSymposium on Atomic Layer Deposition Applications 11
LandVerenigde Staten van Amerika
StadPhoenix
Periode13/10/1515/10/15

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