Spatial atmospheric ALD of functional layers for CIGS Solar Cells

A. Illiberi, C. Frijters, J. E. Balder, P. Poodt, F. Roozeboom

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

8 Citaten (Scopus)
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Spatial Atmospheric Atomic Layer Deposition combines the advantages of temporal ALD, i.e. excellent control of film composition and uniformity over large area substrates, with high growth rates (up to nm/s). In this paper we present a short overview of our research activity carried out on S-ALD of functional thin films for the front window of copper indium gallium di-selenide (CIGS) solar cells. Zn(O,S) and ZnO:Al are grown by co-injecting the vaporized precursors of the cationic (O, S) and anionic (Zn, Al) elements, respectively. An insight on the growth characteristics and properties of Zn(O,S) and ZnO:Al is presented.

Originele taal-2Engels
TitelAtomic Layer Deposition Applications 11
UitgeverijElectrochemical Society, Inc.
Aantal pagina's7
ISBN van elektronische versie9781607685395
StatusGepubliceerd - 2015
EvenementSymposium on Atomic Layer Deposition Applications 11 - Phoenix, Verenigde Staten van Amerika
Duur: 13 okt 201515 okt 2015

Publicatie series

NaamECS Transactions
ISSN van geprinte versie1938-6737


CongresSymposium on Atomic Layer Deposition Applications 11
LandVerenigde Staten van Amerika


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