Simulating the charging of a particle on a surface in a plasma

L.C.J. Heijmans, S. Nijdam

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

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Samenvatting

It is common knowledge that a floating surface will charge negative when a plasma is applied over it. One can imagine that any macroscopic dust particle on the surface will also get charged. The theory that describes this charging is, however, underdeveloped. It has been suggested that the particle will share its charge with the surface, leading to roughly the same surface charge density. This is, however, only valid when both the surface and the particle are electrically conductive. In this contribution, we show a novel model to simulate the charge on a non-conducting particle on a surface in a plasma. It is based on balancing the ion and electron fluxes through the plasma sheath towards the particle. With this, we show that the charge on a particle on a surface can be five orders of magnitude higher than what was previously assumed. Knowledge of the charge on a particle on a surface is important, because it, combined with the plasma sheath electric field, will lead to an electric force on the particle. It has been proposed that this force is important in the lofting of dust from the surface of extra-terrestrial bodies. Additionally, it has been suggested, that it can be used for cleaning in high-tech applications, such as lithography machines and spacecrafts.
Originele taal-2Engels
Titel68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing, 12-16 October 2015, Honolulu, Hawaii
UitgeverijAmerican Physical Society
StatusGepubliceerd - 12 okt 2015
Evenement68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing - Honolulu, Hawaii, Verenigde Staten van Amerika
Duur: 12 okt 201512 okt 2015

Publicatie series

NaamBulletin of the American Physical Society
UitgeverijAPS
Nummer9
Volume60

Congres

Congres68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
LandVerenigde Staten van Amerika
StadHonolulu, Hawaii
Periode12/10/1512/10/15

Bibliografische nota

68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing, 12-16 October 2015, Honolulu, Hawaii

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