@inproceedings{bd6cb526500449ddba94468464152145,
title = "Silicon Nitride Metalenses at Near-Infrared Wavelengths Manufactured Using Deep-Ultraviolet Scanner Lithography",
abstract = "We present the Si3N4 metalenses fabricated on an InP wafer using deep-ultraviolet scanner lithography which is suitable for high-volume manufacturing. Despite limiting the pillar height to 750 nm, preventing full phase coverage, we demonstrate diffraction-limited focusing in the near-infrared regime. Furthermore, we showcase an achromatic metalens design that successfully reduces chromatic aberration by 40\%. These achievements propose a promising alternative for mass-producing metalenses relevant to various applications such as optical sensing.",
keywords = "DUV lithography, Metalens, metasurface, near-infrared, silicon nitride",
author = "David Vocht and Luise Armbruster and Alonso Millan-Mejia and Angel Savov and Yuqing Jiao and Erwin Bente",
year = "2024",
month = jun,
day = "16",
doi = "10.1007/978-3-031-63378-2\_52",
language = "English",
isbn = "978-3-031-63377-5",
series = "Springer Proceedings in Physics",
publisher = "Springer",
pages = "315--322",
editor = "Jeremy Witzens and Joyce Poon and Lars Zimmermann and Wolfgang Freude",
booktitle = "The 25th European Conference on Integrated Optics",
address = "Germany",
note = "25th European Conference on Integrated Optics, ECIO 2024 ; Conference date: 17-06-2024 Through 19-06-2024",
}