Self-assembling processes involved in the molecular beam epitaxy growth of stacked InAs/InP quantum wires

J.M. Ulloa Herrero, P.M. Koenraad, D. Fuster, L. González, Y. González, M.U. González

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

4 Citaten (Scopus)

Samenvatting

The growth mechanism of stacked InAs/InP(001) quantum wires (QWRs) is studied by combining an atomic-scale cross-sectional scanning tunnelling microscopy analysis with in situ and in real-time stress measurements along the [110] direction (sensitive to stress relaxation during QWR formation). QWRs in stacked layers grow by a non-Stranski–Krastanov (SK) process which involves the production of extra InAs by strain-enhanced As/P exchange and a strong strain driven mass transport. Despite the different growth mechanism of the QWR between the first and following layers of the stack, the QWRs maintain on average the same shape and composition in all the layers of the stack, revealing the high stability of this QWR configuration.
Originele taal-2Engels
Artikelnummer445601
Pagina's (van-tot)445601-1/4
TijdschriftNanotechnology
Volume19
Nummer van het tijdschrift44
DOI's
StatusGepubliceerd - 2008

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