TY - JOUR
T1 - Selective-area chemical beam epitaxy of in-plane InAs one-dimensional channels grown on InP(001), InP(111)B, and InP(011) surfaces
AU - Lee, Joon Sue
AU - Choi, Sukgeun
AU - Pendharkar, Mihir
AU - Pennachio, Daniel J.
AU - Markman, Brian
AU - Seas, Michael
AU - Kölling, Sebastian
AU - Verheijen, Marcel A.
AU - Casparis, Lucas
AU - Petersson, Karl D.
AU - Petkovic, Ivana
AU - Schaller, Vanessa
AU - Rodwell, Mark J.W.
AU - Marcus, Charles M.
AU - Krogstrup, Peter
AU - Kouwenhoven, Leo P.
AU - Bakkers, Erik P.A.M.
AU - Palmstrøm, Chris J.
PY - 2019/8/26
Y1 - 2019/8/26
N2 - We report on the selective-area chemical beam epitaxial growth of InAs in-plane, one-dimensional (1D) channels using patterned SiO2-coated InP(001), InP(111)B, and InP(011) substrates to establish a scalable platform for topological superconductor networks. Top-view scanning electron micrographs show excellent surface selectivity and dependence of major facet planes on the substrate orientations and ridge directions, and the ratios of the surface energies of the major facet planes were estimated. Detailed structural properties and defects in the InAs nanowires (NWs) were characterized by transmission electron microscopic analysis of cross-sections perpendicular to the NW ridge direction and along the NW ridge direction. Electrical transport properties of the InAs NWs were investigated using Hall bars, a field effect mobility device, a quantum dot, and an Aharonov-Bohm loop device, which reflect the strong spin-orbit interaction and phase-coherent transport characteristic present in the selectively grown InAs systems. This study demonstrates that selective-area chemical beam epitaxy is a scalable approach to realize semiconductor 1D channel networks with the excellent surface selectivity and this material system is suitable for quantum transport studies.
AB - We report on the selective-area chemical beam epitaxial growth of InAs in-plane, one-dimensional (1D) channels using patterned SiO2-coated InP(001), InP(111)B, and InP(011) substrates to establish a scalable platform for topological superconductor networks. Top-view scanning electron micrographs show excellent surface selectivity and dependence of major facet planes on the substrate orientations and ridge directions, and the ratios of the surface energies of the major facet planes were estimated. Detailed structural properties and defects in the InAs nanowires (NWs) were characterized by transmission electron microscopic analysis of cross-sections perpendicular to the NW ridge direction and along the NW ridge direction. Electrical transport properties of the InAs NWs were investigated using Hall bars, a field effect mobility device, a quantum dot, and an Aharonov-Bohm loop device, which reflect the strong spin-orbit interaction and phase-coherent transport characteristic present in the selectively grown InAs systems. This study demonstrates that selective-area chemical beam epitaxy is a scalable approach to realize semiconductor 1D channel networks with the excellent surface selectivity and this material system is suitable for quantum transport studies.
UR - http://www.scopus.com/inward/record.url?scp=85072518711&partnerID=8YFLogxK
U2 - 10.1103/PhysRevMaterials.3.084606
DO - 10.1103/PhysRevMaterials.3.084606
M3 - Article
AN - SCOPUS:85072518711
SN - 2475-9953
VL - 3
JO - Physical Review Materials
JF - Physical Review Materials
IS - 8
M1 - 084606
ER -