Roughness evolution of high rate a-Si:H growth using an espanding thermal plasma

A.H.M. Smets; Richard Sanden, van de; D.C. Schram

Roughness evolution of high rate a-Si:H growth using an espanding thermal plasma

A.H.M. Smets, Richard Sanden, van de, D.C. Schram

Plasma & Materials Processing

Onderzoeksoutput: Bijdrage aan congres › Poster

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Abstract only.

Originele taal-2	Engels
Pagina's	P10-
Status	Gepubliceerd - 1999
Evenement	2nd Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP-2), December 2-3, 1999, Kerkrade, The Netherlands - Conference centre "Rolduc", Kerkrade, Nederland Duur: 2 dec. 1999 → 3 dec. 1999

Workshop

Workshop	2nd Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP-2), December 2-3, 1999, Kerkrade, The Netherlands
Verkorte titel	WELTPP-2
Land/Regio	Nederland
Stad	Kerkrade
Periode	2/12/99 → 3/12/99
Ander	2nd Euregional WELT-PP Workshop on the Exploration of Low Temperature Plasma Physics, December 2-3, 1999, Rolduc, Kerkrade, The Netherlands

Bibliografische nota

Poster presented at the 2nd Euregional WELT-PP Workshop on the Exploration of Low Temperature Plasma Physics, December 2nd and 3rd, 1999, Rolduc, The Netherlands

Citeer dit

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title = "Roughness evolution of high rate a-Si:H growth using an espanding thermal plasma",

abstract = "Abstract only.",

author = "A.H.M. Smets and \{Sanden, van de\}, Richard and D.C. Schram",

note = "Poster presented at the 2nd Euregional WELT-PP Workshop on the Exploration of Low Temperature Plasma Physics, December 2nd and 3rd, 1999, Rolduc, The Netherlands; 2nd Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP-2), December 2-3, 1999, Kerkrade, The Netherlands, WELTPP-2 ; Conference date: 02-12-1999 Through 03-12-1999",

year = "1999",

language = "English",

pages = "P10--",

}

Roughness evolution of high rate a-Si:H growth using an espanding thermal plasma. / Smets, A.H.M.; Sanden, van de, Richard ; Schram, D.C.
1999. P10- Postersessie gepresenteerd op 2nd Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP-2), December 2-3, 1999, Kerkrade, The Netherlands, Kerkrade, Nederland.

Onderzoeksoutput: Bijdrage aan congres › Poster

TY - CONF

T1 - Roughness evolution of high rate a-Si:H growth using an espanding thermal plasma

AU - Smets, A.H.M.

AU - Sanden, van de, Richard

AU - Schram, D.C.

N1 - Poster presented at the 2nd Euregional WELT-PP Workshop on the Exploration of Low Temperature Plasma Physics, December 2nd and 3rd, 1999, Rolduc, The Netherlands

PY - 1999

Y1 - 1999

N2 - Abstract only.

AB - Abstract only.

M3 - Poster

SP - P10-

T2 - 2nd Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP-2), December 2-3, 1999, Kerkrade, The Netherlands

Y2 - 2 December 1999 through 3 December 1999

ER -

Roughness evolution of high rate a-Si:H growth using an espanding thermal plasma

Samenvatting

Workshop

Bibliografische nota

Vingerafdruk

Citeer dit