Recombination and diffusion processes in an ICP investigated by the power interruption technique

J.M. Regt, de; J. Jonkers; J.J.A.M. Mullen, van der

doi:10.1109/PLASMA.1996.550685

Recombination and diffusion processes in an ICP investigated by the power interruption technique

J.M. Regt, de, J. Jonkers, J.J.A.M. Mullen, van der

Plasma & Materials Processing

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Summary form only given. Inductively coupled plasmas (ICP) are widely used for spectrochemical analysis and might be efficient light sources of the future. Knowledge on the properties of these type of plasmas car improve their applicability. For this aim, fundamental research is carried out on the diffusion and recombination processes in an argon ICP by studying the electron density and temperature behavior during power interruption.

Originele taal-2	Engels
Pagina's	157-157
DOI's	https://doi.org/10.1109/PLASMA.1996.550685
Status	Gepubliceerd - 1996
Evenement	23rd IEEE International Conference on Plasma Science, ICOPS 1996 - Boston, Verenigde Staten van Amerika Duur: 3 jun. 1996 → 5 jun. 1996 Congresnummer: 23

Congres

Congres	23rd IEEE International Conference on Plasma Science, ICOPS 1996
Verkorte titel	ICOPS 1996
Land/Regio	Verenigde Staten van Amerika
Stad	Boston
Periode	3/06/96 → 5/06/96
Ander	1996 IEEE international conference on plasma science, June 3-5, 1996, Boston, Massachusetts, USA

Bibliografische nota

Poster presented at the 1996 IEEE international conference on plasma science, June 3-5, 1996, Boston, Massachusetts, USA

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10.1109/PLASMA.1996.550685

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@conference{090d7dbecafe4a07b11fe24ddf61f276,

title = "Recombination and diffusion processes in an ICP investigated by the power interruption technique",

abstract = "Summary form only given. Inductively coupled plasmas (ICP) are widely used for spectrochemical analysis and might be efficient light sources of the future. Knowledge on the properties of these type of plasmas car improve their applicability. For this aim, fundamental research is carried out on the diffusion and recombination processes in an argon ICP by studying the electron density and temperature behavior during power interruption.",

author = "{Regt, de}, J.M. and J. Jonkers and {Mullen, van der}, J.J.A.M.",

note = "Poster presented at the 1996 IEEE international conference on plasma science, June 3-5, 1996, Boston, Massachusetts, USA; 23rd IEEE International Conference on Plasma Science, ICOPS 1996, ICOPS 1996 ; Conference date: 03-06-1996 Through 05-06-1996",

year = "1996",

doi = "10.1109/PLASMA.1996.550685",

language = "English",

pages = "157--157",

}

TY - CONF

T1 - Recombination and diffusion processes in an ICP investigated by the power interruption technique

AU - Regt, de, J.M.

AU - Jonkers, J.

AU - Mullen, van der, J.J.A.M.

N1 - Conference code: 23

PY - 1996

Y1 - 1996

N2 - Summary form only given. Inductively coupled plasmas (ICP) are widely used for spectrochemical analysis and might be efficient light sources of the future. Knowledge on the properties of these type of plasmas car improve their applicability. For this aim, fundamental research is carried out on the diffusion and recombination processes in an argon ICP by studying the electron density and temperature behavior during power interruption.

AB - Summary form only given. Inductively coupled plasmas (ICP) are widely used for spectrochemical analysis and might be efficient light sources of the future. Knowledge on the properties of these type of plasmas car improve their applicability. For this aim, fundamental research is carried out on the diffusion and recombination processes in an argon ICP by studying the electron density and temperature behavior during power interruption.

U2 - 10.1109/PLASMA.1996.550685

DO - 10.1109/PLASMA.1996.550685

M3 - Poster

SP - 157

EP - 157

T2 - 23rd IEEE International Conference on Plasma Science, ICOPS 1996

Y2 - 3 June 1996 through 5 June 1996

ER -

Recombination and diffusion processes in an ICP investigated by the power interruption technique

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