Reaction mechanisms during remote plasma ALD for low temperature materials and energy-related applications

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Abstract only.

Originele taal-2	Engels
Aantal pagina's	2
Status	Gepubliceerd - 2009
Evenement	9th International Conference on Atomic Layer Deposition (ALD 2009), Monterey, USA - Monterey, California, Verenigde Staten van Amerika Duur: 19 jul. 2009 → 22 jul. 2009 Congresnummer: 9

Congres	9th International Conference on Atomic Layer Deposition (ALD 2009), Monterey, USA
Verkorte titel	ALD 2009
Land/Regio	Verenigde Staten van Amerika
Stad	Monterey, California
Periode	19/07/09 → 22/07/09

@conference{51282e68679c47169e553debccda2977,

title = "Reaction mechanisms during remote plasma ALD for low temperature materials and energy-related applications",

abstract = "Abstract only.",

author = "W.M.M. Kessels",

year = "2009",

language = "English",

note = "9th International Conference on Atomic Layer Deposition (ALD 2009), ALD 2009 ; Conference date: 19-07-2009 Through 22-07-2009",

}