Samenvatting
We report the post-processing of a passive polarisation converter (PC) in a photonic integrated circuit that is realized in a Multi_Project Wafer run at Oclaro. The chip contains structures for testing the PC in a polarization independent SOA configuration.
Photo-resist is used to protect the existing devices, and a photo-lithography step defines the PC processing area. The device is made using wet etching to define the PC sloped sidewall, and EBL to define the PC waveguide. The measurement results show that the polarization dependence of the SOA reduced from 14 dB to 3 dB with the PC insertion.
Originele taal-2 | Engels |
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Titel | Proceedings of the 16th Annual symposium of the IEEE Photonics Benelux Chapter, 01-02 December 2011, Ghent, Belgium |
Redacteuren | P. Bienstman, G. Morthier, G. Roelkens, xx et al. |
Plaats van productie | Ghent, Belgium |
Uitgeverij | Universiteit Gent |
Pagina's | 177-180 |
ISBN van geprinte versie | 978-90-85784-67-8 |
Status | Gepubliceerd - 2011 |
Evenement | 16th Annual Symposium of the IEEE Photonics Benelux Chapter - Ghent, België Duur: 1 dec. 2011 → 2 dec. 2011 Congresnummer: 16 http://www.photonics-benelux.org/symp11/ |
Congres
Congres | 16th Annual Symposium of the IEEE Photonics Benelux Chapter |
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Land/Regio | België |
Stad | Ghent |
Periode | 1/12/11 → 2/12/11 |
Ander | 16th Annual Symposium of the IEEE Photonics Benelux Chapter |
Internet adres |