Position control in lithographic equipment

H. Butler, W. Simons

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

4 Citaten (Scopus)
15 Downloads (Pure)

Samenvatting

In IC manufacturing, lithographic scanners expose a circuit pattern onto a semiconductor wafer by means of an optical system. The stage holding the wafer must have a scanning position accuracy of only a few nanometers to support imaging and overlay requirements. In the past 10 years, stage acceleration, position error and settling time have all improved 5-8 times. Compared to lithographic steppers of 25 years ago, the number of controlled stage axes has grown from 3 (analog) to 50 (high-speed digital).
Originele taal-2Engels
TitelProceedings of the ASPE 2013 Spring Topical Meeting MIT Laboratory for Manufacturing and Productivity Annual Summit, 21-23 April 2013, Cambridge, Massachusetts
Plaats van productieRaleigh
UitgeverijAmerican Society of Precision Engineering (ASPE)
Pagina's7-12
StatusGepubliceerd - 2013
EvenementASPE 2013 Spring Topical Meeting MIT Laboratory for Manufacturing and Productivity Annual Summit -
Duur: 21 apr 201323 apr 2013

Congres

CongresASPE 2013 Spring Topical Meeting MIT Laboratory for Manufacturing and Productivity Annual Summit
Periode21/04/1323/04/13
AnderASPE 2013 Spring Topical Meeting MIT Laboratory for Manufacturing and Productivity Annual Summit

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