Polymer layers by Initiated CVD for thin film gas barrier encapsulation

D.A. Spee; J.K. Rath; R.E.I. Schropp

doi:10.1002/9781118729175.ch9

Polymer layers by Initiated CVD for thin film gas barrier encapsulation

D.A. Spee
, J.K. Rath
, R.E.I. Schropp

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Hoofdstuk › Academic › peer review

3 Citaten (Scopus)

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In this chapter a thorough description of the initiated chemical vapor deposition (iCVD) process will be given, concentrating on molecular weight and deposition rate of the deposited polymer, which are essential for largescale application in hybrid gas barriers. Practical applications of coatings by iCVD are addressed, and it will be shown that iCVD single layers can be used individually as gas barriers. However, so far the intrinsic moisture barrier function of polymers is too low to meet the strict requirements that are needed for organic light emitting diodes (OLEDs) and organic solar cells. Ultra-high gas barriers, with a WVTR

Originele taal-2	Engels
Titel	Encapsulation nanotechnologies
Redacteuren	V. Mittal
Plaats van productie	Beverly
Uitgeverij	Scrivener Publishing
Hoofdstuk	9
Pagina's	291-345
ISBN van geprinte versie	978-1-118-34455-2
DOI's	https://doi.org/10.1002/9781118729175.ch9
Status	Gepubliceerd - 13 mei 2013
Extern gepubliceerd	Ja

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author = "D.A. Spee and J.K. Rath and R.E.I. Schropp",

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Polymer layers by Initiated CVD for thin film gas barrier encapsulation

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