Plasma-surface interaction during the growth of silicon thin films : in situ plasma and surface studies

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic

Originele taal-2	Engels
Titel	First International Symposium on Atomically Controlled Fabrication Technology – Surface and Thin Film Processing
Pagina's	2-4
Status	Gepubliceerd - 2010

Citeer dit

@inproceedings{5b979c622a21420bbd8e9b10530f45b3,

title = "Plasma-surface interaction during the growth of silicon thin films : in situ plasma and surface studies",

author = "\{Sanden, van de\}, M.C.M.",

year = "2010",

language = "English",

pages = "2--4",

booktitle = "First International Symposium on Atomically Controlled Fabrication Technology – Surface and Thin Film Processing",

}