Plasma properties of a novel commercial plasma source for high-throughput processing of c-Si solar cells

P.J. Oever, van den, W.M.M. Kessels, B. Hoex, R.C.M. Bosch, A.J.M. van Erven, R.L.J.R. Pennings, W.T.M. Stals, M.D. Bijker, M.C.M. Sanden, van de

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

2 Citaten (Scopus)

Samenvatting

A novel commercial plasma source for highthroughput processing of crystalline silicon solar cells is presented. In this paper, the plasma properties of this socalled Expanding Thermal Plasma (ETP) technique are addressed in detail and its application in an inline PECVD tool for uftrahigh-rate deposition of silicon nitride for antireflection coating purposes is described.
Originele taal-2Engels
TitelProceedings of the 31st Conference Record on Photovoltaic Specialists, 3-7 January 2005, Coronado Springs Resort, Lake Buena Vista, FL,USA
Pagina's1320-1323
StatusGepubliceerd - 2005

Publicatie series

NaamConference Record of the IEEE Photovoltaic Specialists Conference
Volume31st
ISSN van geprinte versie0160-8371

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