Plasma processing and the importance of surface molecule generation

D.C. Schram, R.A.B. Zijlmans, J.H. Helden, van, O.G. Gabriel, G. Yagci, S. Welzel, J. Röpcke, R.A.H. Engeln

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In plasma processing the efficient dissociation of molecules is the key element for producing the precursors for plasma deposition, surface modification, and molecule conversion. During these processes always molecules are generated, as e.g. H2 in deposition of hydrogenated carbon or molecules may be converted to new molecules. Measurement of molecules is thus a possible way to investigate the reactive pathways in plasma chemistry. It appears that the surface plays a pertinent role in the formation of molecules. This became clear from the study of several plasmas, including the remote plasma of an expanding thermal plasma. Measurements by mass spectrometry and infrared absorption indicate several dominant pathways as re-formation of N2 and O2 besides a small percentage of NO in N/O, the formation of ammonia in N/H, of water in H/O and CO and H2 in H/C/N/O containing plasmas. The presence of excited molecules presumably generated at the surface bordering the plasma indicates the presence of modified chemistry in a plasma environment.
Originele taal-2Engels
Pagina's (van-tot)1904-1909
TijdschriftJournal of Optoelectronics and Advanced Materials
Volume10
Nummer van het tijdschrift8
StatusGepubliceerd - 2008

Vingerafdruk

Plasma applications
Molecules
Plasmas
molecules
Plasma Gases
Plasma deposition
plasma chemistry
Hydrogen
thermal plasmas
Infrared absorption
Carbon Monoxide
Ammonia
infrared absorption
Mass spectrometry
Surface treatment
ammonia
mass spectroscopy
Carbon
dissociation
chemistry

Citeer dit

Schram, D. C., Zijlmans, R. A. B., Helden, van, J. H., Gabriel, O. G., Yagci, G., Welzel, S., ... Engeln, R. A. H. (2008). Plasma processing and the importance of surface molecule generation. Journal of Optoelectronics and Advanced Materials, 10(8), 1904-1909.
Schram, D.C. ; Zijlmans, R.A.B. ; Helden, van, J.H. ; Gabriel, O.G. ; Yagci, G. ; Welzel, S. ; Röpcke, J. ; Engeln, R.A.H. / Plasma processing and the importance of surface molecule generation. In: Journal of Optoelectronics and Advanced Materials. 2008 ; Vol. 10, Nr. 8. blz. 1904-1909.
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Schram, DC, Zijlmans, RAB, Helden, van, JH, Gabriel, OG, Yagci, G, Welzel, S, Röpcke, J & Engeln, RAH 2008, 'Plasma processing and the importance of surface molecule generation', Journal of Optoelectronics and Advanced Materials, vol. 10, nr. 8, blz. 1904-1909.

Plasma processing and the importance of surface molecule generation. / Schram, D.C.; Zijlmans, R.A.B.; Helden, van, J.H.; Gabriel, O.G.; Yagci, G.; Welzel, S.; Röpcke, J.; Engeln, R.A.H.

In: Journal of Optoelectronics and Advanced Materials, Vol. 10, Nr. 8, 2008, blz. 1904-1909.

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

TY - JOUR

T1 - Plasma processing and the importance of surface molecule generation

AU - Schram, D.C.

AU - Zijlmans, R.A.B.

AU - Helden, van, J.H.

AU - Gabriel, O.G.

AU - Yagci, G.

AU - Welzel, S.

AU - Röpcke, J.

AU - Engeln, R.A.H.

PY - 2008

Y1 - 2008

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AB - In plasma processing the efficient dissociation of molecules is the key element for producing the precursors for plasma deposition, surface modification, and molecule conversion. During these processes always molecules are generated, as e.g. H2 in deposition of hydrogenated carbon or molecules may be converted to new molecules. Measurement of molecules is thus a possible way to investigate the reactive pathways in plasma chemistry. It appears that the surface plays a pertinent role in the formation of molecules. This became clear from the study of several plasmas, including the remote plasma of an expanding thermal plasma. Measurements by mass spectrometry and infrared absorption indicate several dominant pathways as re-formation of N2 and O2 besides a small percentage of NO in N/O, the formation of ammonia in N/H, of water in H/O and CO and H2 in H/C/N/O containing plasmas. The presence of excited molecules presumably generated at the surface bordering the plasma indicates the presence of modified chemistry in a plasma environment.

M3 - Article

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JO - Journal of Optoelectronics and Advanced Materials

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SN - 1454-4164

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Schram DC, Zijlmans RAB, Helden, van JH, Gabriel OG, Yagci G, Welzel S et al. Plasma processing and the importance of surface molecule generation. Journal of Optoelectronics and Advanced Materials. 2008;10(8):1904-1909.