Plasma-enhanced atmospheric-pressure spatial ALD of Al2O3 and ZrO2

Y. Creyghton, A. Illiberi, A. Mione, W. Van Boekel, N. Debernardi, M. Seitz, F. Van Den Bruele, P. Poodt, F. Roozeboom

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

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Samenvatting

Non-thermal plasma sources are known to lower the operation temperatures and widen the process windows in thermal ALD of thin-film materials. In spatial ALD, novel plasma sources with exceptional dimensional and chemical stability are required to provide the flow geometries optimized for efficient transport and use of radicals (O, N, H, OH, NH, etc.). This paper describes our preliminary efforts to provide and examine the required linear scalable plasma sources in spatial ALD reactors. The effectiveness of close-proximity direct and remote plasma sources was demonstrated for thin dielectric films of Al2O3 and ZrO2 deposited at temperatures ranging from 20 to 100 °C. Both direct and remote SDBD-type (Surface Dielectric Barrier Discharge) plasma sources were applied using conventional metal precursors and O2/N2 plasma. The remote plasma designs proved advantageous in avoiding electrical source-substrate interactions which often result in layer or substrate damage caused by filamentary plasma discharges impacting the substrate.

Originele taal-2Engels
TitelAtomic Layer Deposition Applications 12
UitgeverijElectrochemical Society, Inc.
Pagina's11-19
Aantal pagina's9
Volume75
Uitgave6
ISBN van elektronische versie9781607685395
DOI's
StatusGepubliceerd - 6 okt 2016
EvenementSymposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting - Honolulu, Verenigde Staten van Amerika
Duur: 2 okt 20167 okt 2016
https://ecs.confex.com/ecs/230/cfp.cgi

Publicatie series

NaamECS Transactions
Nummer6
Volume75
ISSN van elektronische versie1938-5862

Congres

CongresSymposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting
Land/RegioVerenigde Staten van Amerika
StadHonolulu
Periode2/10/167/10/16
Internet adres

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