@inproceedings{48973615c866490ca3efa277f5a113d8,
title = "Plasma-assisted atomic layer deposition of SrTiO3 : stoichiometry and crystallization study by spectroscopic ellipsometry",
abstract = "Strontium titanate (SrTiO3, STO) films were deposited by plasma-assisted ALD using cyclopentadienyl-based Sr and Ti precursors with O2 plasma as the oxidizing agent. As determined from Rutherford backscattering spectroscopy (RBS), [Sr]/[Ti] ratios ranging from 0.73 to 2.13 were achieved for 30-40 nm thick films by tuning the [SrO]/[TiO2] ALD cycle ratio. Films deposited at 250 °C were amorphous and required post-deposition annealing to crystallize into the ultrahigh-k perovskite structure. The crystallization temperature strongly depended on the film composition as observed by X-ray diffraction (XRD) measurements after rapid thermal annealing (RTA). Using RBS and XRD data as a combined-cross reference, it was shown that the film stoichiometry and the crystallinity can be probed directly by spectroscopic ellipsometry (SE).",
author = "V. Longo and N. Leick and F. Roozeboom and W.M.M. Kessels",
year = "2011",
doi = "10.1149/1.3633655",
language = "English",
series = "ECS Transactions",
publisher = "ECS",
pages = "63--72",
editor = "\{Gendt, de\}, A. and A. Londergan and S. Bent and \{Straten, van der\}, O. and A. Delabie and F. Roozeboom",
booktitle = "Proceedings of the 220th ECS meeting and Electrochemical Energy Summit, October 9-14, 2011, Boston, Massachusetts",
note = "conference; Atomic Layer Deposition Applications 7 ; Conference date: 01-01-2011",
}