Plasma-assisted atomic layer deposition of SrTiO3 : stoichiometry and crystallization study by spectroscopic ellipsometry

V. Longo, N. Leick, F. Roozeboom, W.M.M. Kessels

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

7 Citaten (Scopus)
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Samenvatting

Strontium titanate (SrTiO3, STO) films were deposited by plasma-assisted ALD using cyclopentadienyl-based Sr and Ti precursors with O2 plasma as the oxidizing agent. As determined from Rutherford backscattering spectroscopy (RBS), [Sr]/[Ti] ratios ranging from 0.73 to 2.13 were achieved for 30-40 nm thick films by tuning the [SrO]/[TiO2] ALD cycle ratio. Films deposited at 250 °C were amorphous and required post-deposition annealing to crystallize into the ultrahigh-k perovskite structure. The crystallization temperature strongly depended on the film composition as observed by X-ray diffraction (XRD) measurements after rapid thermal annealing (RTA). Using RBS and XRD data as a combined-cross reference, it was shown that the film stoichiometry and the crystallinity can be probed directly by spectroscopic ellipsometry (SE).
Originele taal-2Engels
TitelProceedings of the 220th ECS meeting and Electrochemical Energy Summit, October 9-14, 2011, Boston, Massachusetts
RedacteurenA. Gendt, de, A. Londergan, S. Bent, O. Straten, van der, A. Delabie, F. Roozeboom
Plaats van productiePennington
UitgeverijECS
Pagina's63-72
DOI's
StatusGepubliceerd - 2011
Evenementconference; Atomic Layer Deposition Applications 7 -
Duur: 1 jan 2011 → …

Publicatie series

NaamECS Transactions
Volume41
ISSN van geprinte versie1938-6737

Congres

Congresconference; Atomic Layer Deposition Applications 7
Periode1/01/11 → …
AnderAtomic Layer Deposition Applications 7

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