Plasma-assisted atomic layer deposition of conductive HfNx: on the role of plasma chemistry and ions in tailoring film properties

Saurabh Karwal

Onderzoeksoutput: Scriptie › Dissertatie 1 (Onderzoek TU/e / Promotie TU/e)

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Originele taal-2	Engels
Kwalificatie	Doctor in de Filosofie
Toekennende instantie	Applied Physics and Science Education
Begeleider(s)/adviseur	Creatore, M. (Adriana), Promotor Kessels, W.M.M. (Erwin), Promotor Verheijen, Marcel A., Co-Promotor
Datum van toekenning	6 feb. 2020
Plaats van publicatie	Eindhoven
Uitgever	Technische Universiteit Eindhoven
Gedrukte ISBN's	978-90-386-4946-7
Status	Gepubliceerd - 6 feb. 2020

Proefschrift.

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@phdthesis{3fcf913415fd40338e3a700970195c11,

title = "Plasma-assisted atomic layer deposition of conductive HfNx: on the role of plasma chemistry and ions in tailoring film properties",

author = "Saurabh Karwal",

note = "Proefschrift.",

year = "2020",

month = feb,

day = "6",

language = "English",

isbn = "978-90-386-4946-7",

publisher = "Technische Universiteit Eindhoven",

type = "Phd Thesis 1 (Research TU/e / Graduation TU/e)",

school = "Applied Physics and Science Education",

}