Samenvatting
The usage of plasma as a reactant in atomic layer deposition processes started out as a niche process but in the meantime had its breakthrough in high-volume manufacturing in nano-electronics.
Understanding the processes in plasma ALD is challenging but the knowledge in the Netherlands on plasma science, surface science and the ALD end-applications are a perfect foundation for a globally leading position in this field.
Understanding the processes in plasma ALD is challenging but the knowledge in the Netherlands on plasma science, surface science and the ALD end-applications are a perfect foundation for a globally leading position in this field.
| Originele taal-2 | Engels |
|---|---|
| Pagina's (van-tot) | 10-13 |
| Tijdschrift | Nevac Blad |
| Volume | 58 |
| Nummer van het tijdschrift | 2 |
| Status | Gepubliceerd - 2 jun. 2020 |