P-111 : a thin film encapsulation stack for PLED and OLED displays

F.J.H. Assche, van; R.T. Vangheluwe; J.W.C. Maes; W.S. Mischke; M.D. Bijker; F.C. Dings; M.F.J. Evers; W.M.M. Kessels; M.C.M. Sanden, van de

doi:10.1889/1.1831072

P-111 : a thin film encapsulation stack for PLED and OLED displays

F.J.H. Assche, van, R.T. Vangheluwe, J.W.C. Maes, W.S. Mischke, M.D. Bijker, F.C. Dings, M.F.J. Evers, W.M.M. Kessels, M.C.M. Sanden, van de

Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review

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For a thin film (<1 µm) encapsulation stack consisting of only 3 plasma deposited silicon nitride layers separated by a thin (<100 nm) organic layer, a water permeation rate of below 10–5 g/m2 per day at 50 °C and 50% rH has been measured using the Ca test. PLED lifetimes of over 500 hours at 60 °C and 90% rH have been reached locally. While the Ca test indicates that pinhole free encapsulation is possible, edge and particle related defects still forecast a challenge for device encapsulation.

Originele taal-2	Engels
Pagina's (van-tot)	695-697
Tijdschrift	Digest of Technical Papers - SID International Symposium
Volume	35
Nummer van het tijdschrift	1
DOI's	https://doi.org/10.1889/1.1831072
Status	Gepubliceerd - 2004

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10.1889/1.1831072

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@article{0ce3196cf28f4840873bb2c498236211,

title = "P-111 : a thin film encapsulation stack for PLED and OLED displays",

abstract = "For a thin film (<1 µm) encapsulation stack consisting of only 3 plasma deposited silicon nitride layers separated by a thin (<100 nm) organic layer, a water permeation rate of below 10–5 g/m2 per day at 50 °C and 50% rH has been measured using the Ca test. PLED lifetimes of over 500 hours at 60 °C and 90% rH have been reached locally. While the Ca test indicates that pinhole free encapsulation is possible, edge and particle related defects still forecast a challenge for device encapsulation.",

author = "{Assche, van}, F.J.H. and R.T. Vangheluwe and J.W.C. Maes and W.S. Mischke and M.D. Bijker and F.C. Dings and M.F.J. Evers and W.M.M. Kessels and {Sanden, van de}, M.C.M.",

year = "2004",

doi = "10.1889/1.1831072",

language = "English",

volume = "35",

pages = "695--697",

journal = "Digest of Technical Papers - SID International Symposium",

issn = "0097-966X",

publisher = "John Wiley and Sons Inc",

number = "1",

}

TY - JOUR

T1 - P-111 : a thin film encapsulation stack for PLED and OLED displays

AU - Assche, van, F.J.H.

AU - Vangheluwe, R.T.

AU - Maes, J.W.C.

AU - Mischke, W.S.

AU - Bijker, M.D.

AU - Dings, F.C.

AU - Evers, M.F.J.

AU - Kessels, W.M.M.

AU - Sanden, van de, M.C.M.

PY - 2004

Y1 - 2004

N2 - For a thin film (<1 µm) encapsulation stack consisting of only 3 plasma deposited silicon nitride layers separated by a thin (<100 nm) organic layer, a water permeation rate of below 10–5 g/m2 per day at 50 °C and 50% rH has been measured using the Ca test. PLED lifetimes of over 500 hours at 60 °C and 90% rH have been reached locally. While the Ca test indicates that pinhole free encapsulation is possible, edge and particle related defects still forecast a challenge for device encapsulation.

AB - For a thin film (<1 µm) encapsulation stack consisting of only 3 plasma deposited silicon nitride layers separated by a thin (<100 nm) organic layer, a water permeation rate of below 10–5 g/m2 per day at 50 °C and 50% rH has been measured using the Ca test. PLED lifetimes of over 500 hours at 60 °C and 90% rH have been reached locally. While the Ca test indicates that pinhole free encapsulation is possible, edge and particle related defects still forecast a challenge for device encapsulation.

U2 - 10.1889/1.1831072

DO - 10.1889/1.1831072

M3 - Article

SN - 0097-966X

VL - 35

SP - 695

EP - 697

JO - Digest of Technical Papers - SID International Symposium

JF - Digest of Technical Papers - SID International Symposium

IS - 1

ER -

P-111 : a thin film encapsulation stack for PLED and OLED displays

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