Optical diagnostics for plasma etching

T.H.J. Bisschops; G.M.W. Kroesen; E.M. Veldhuizen, van; C.J.H. de Zeeuw

Optical diagnostics for plasma etching

T.H.J. Bisschops, G.M.W. Kroesen, E.M. Veldhuizen, van, C.J.H. de Zeeuw

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

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Several optical diagnostics were used to det. plasma properties and etch rates in an single wafer etch reactor. Results of UV-visible spectroscopy and IR absorption spectroscopy, indicating different mol. species and their densities are presented. The construction of an interferometer to det. the gas temp. and of an ellipsometer to det. the in situ each rate are also described.

Originele taal-2	Engels
Titel	7th International Symposium on Plasma Chemistry, Eindhoven, The Netherlands, July 1-15, 1985: symposium proceedings
Redacteuren	C.J. Timmermans
Plaats van productie	Eindhoven
Uitgeverij	Eindhoven University of Technology
Pagina's	617-621
Volume	2
Status	Gepubliceerd - 1985

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@inproceedings{cce4f863883b4da58652896623e48ce9,

title = "Optical diagnostics for plasma etching",

abstract = "Several optical diagnostics were used to det. plasma properties and etch rates in an single wafer etch reactor. Results of UV-visible spectroscopy and IR absorption spectroscopy, indicating different mol. species and their densities are presented. The construction of an interferometer to det. the gas temp. and of an ellipsometer to det. the in situ each rate are also described.",

author = "T.H.J. Bisschops and G.M.W. Kroesen and {Veldhuizen, van}, E.M. and {de Zeeuw}, C.J.H.",

year = "1985",

language = "English",

volume = "2",

pages = "617--621",

editor = "C.J. Timmermans",

booktitle = "7th International Symposium on Plasma Chemistry, Eindhoven, The Netherlands, July 1-15, 1985: symposium proceedings",

publisher = "Eindhoven University of Technology",

}

Optical diagnostics for plasma etching. / Bisschops, T.H.J.; Kroesen, G.M.W.; Veldhuizen, van, E.M. et al.
7th International Symposium on Plasma Chemistry, Eindhoven, The Netherlands, July 1-15, 1985: symposium proceedings. uitgave / C.J. Timmermans. Vol. 2 Eindhoven: Eindhoven University of Technology, 1985. blz. 617-621.

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

TY - GEN

T1 - Optical diagnostics for plasma etching

AU - Bisschops, T.H.J.

AU - Kroesen, G.M.W.

AU - Veldhuizen, van, E.M.

AU - de Zeeuw, C.J.H.

PY - 1985

Y1 - 1985

N2 - Several optical diagnostics were used to det. plasma properties and etch rates in an single wafer etch reactor. Results of UV-visible spectroscopy and IR absorption spectroscopy, indicating different mol. species and their densities are presented. The construction of an interferometer to det. the gas temp. and of an ellipsometer to det. the in situ each rate are also described.

AB - Several optical diagnostics were used to det. plasma properties and etch rates in an single wafer etch reactor. Results of UV-visible spectroscopy and IR absorption spectroscopy, indicating different mol. species and their densities are presented. The construction of an interferometer to det. the gas temp. and of an ellipsometer to det. the in situ each rate are also described.

M3 - Conference contribution

VL - 2

SP - 617

EP - 621

BT - 7th International Symposium on Plasma Chemistry, Eindhoven, The Netherlands, July 1-15, 1985: symposium proceedings

A2 - Timmermans, C.J.

PB - Eindhoven University of Technology

CY - Eindhoven

ER -

Optical diagnostics for plasma etching

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