Offset printing of liquid microstructures for high resolution lithography

S.M. Miller, A.A. Darhuber, S.M. Troian, S. Wagner

    Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

    2 Citaten (Scopus)


    We have investigated the direct printing of polymer solutions from a chemically patterned stamp onto a hydrophilic target substrate as a new high-throughput alternative to optical lithography. The patterns on the stamp, which are typically in the micron size range, define regions of alternating wettability. They are produced by patterning a hydrophobic self-assembled monolayer previously deposited onto a hydrophilic surface, typically a glass slide or silicon wafer with a natural oxide coating. Polar liquids or aqueous polymeric solutions are then deposited only onto the hydrophilic surface patterns by dip-coating the stamp in a liquid reservoir. The deposited film thickness depends critically on the speed of withdrawal and the feature size and shape. For vertically oriented hydrophilic stripes dipped in a reservoir containing a polar liquid, we have developed a theoretical model whose prediction for the maximum deposited film thickness agrees exceptionally well with experimental measurements. After deposition, the wetted stamp is pressed against a target substrate by means of a motion controlled press. In this way we have so far printed 5µm wide polyethylene oxide lines onto a silicon wafer.
    Originele taal-2Engels
    TitelMaterials development for direct write technologies : symposium held April 24-26, 2000, San Francisco, California, U.S.A.
    Plaats van productieWarrendale
    UitgeverijMaterials Research Society
    ISBN van geprinte versie1-55899-532-3
    StatusGepubliceerd - 2000

    Publicatie series

    NaamMaterials Research Society symposium proceedings
    ISSN van geprinte versie0272-9172


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