New transition probability values for argon used for mapping open and closed inductively coupled plasmas

J.J.A.M. Mullen, van der; R.D. Tas; J.M. Regt, de; J. Jonkers

New transition probability values for argon used for mapping open and closed inductively coupled plasmas

J.J.A.M. Mullen, van der, R.D. Tas, J.M. Regt, de, J. Jonkers

Plasma & Materials Processing

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

Originele taal-2	Engels
Titel	Progress in Plasma Processing of Materials 1997, Proceedings of the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996
Redacteuren	P. Fauchais
Plaats van productie	New York
Uitgeverij	Begell House Inc.
Pagina's	229-237
ISBN van geprinte versie	1-56700-093-2
Status	Gepubliceerd - 1997
Evenement	conference; Progress in Plasma Processing of Materials 1997 : the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996 - Duur: 1 jan. 1997 → …

Congres

Congres	conference; Progress in Plasma Processing of Materials 1997 : the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996
Periode	1/01/97 → …
Ander	Progress in Plasma Processing of Materials 1997 : the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996

Citeer dit

Mullen, van der, J. J. A. M., Tas, R. D., Regt, de, J. M., & Jonkers, J. (1997). New transition probability values for argon used for mapping open and closed inductively coupled plasmas. In P. Fauchais (editor), Progress in Plasma Processing of Materials 1997, Proceedings of the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996 (blz. 229-237). Begell House Inc..

Mullen, van der, J.J.A.M. ; Tas, R.D. ; Regt, de, J.M. et al. / New transition probability values for argon used for mapping open and closed inductively coupled plasmas. Progress in Plasma Processing of Materials 1997, Proceedings of the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996. redacteur / P. Fauchais. New York : Begell House Inc., 1997. blz. 229-237

@inproceedings{cfac14d9b33f44818bf38f53f77f2994,

title = "New transition probability values for argon used for mapping open and closed inductively coupled plasmas",

author = "{Mullen, van der}, J.J.A.M. and R.D. Tas and {Regt, de}, J.M. and J. Jonkers",

year = "1997",

language = "English",

isbn = "1-56700-093-2",

pages = "229--237",

editor = "P. Fauchais",

booktitle = "Progress in Plasma Processing of Materials 1997, Proceedings of the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996",

publisher = "Begell House Inc.",

address = "United States",

note = "conference; Progress in Plasma Processing of Materials 1997 : the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996 ; Conference date: 01-01-1997",

}

Mullen, van der, JJAM, Tas, RD, Regt, de, JM & Jonkers, J 1997, New transition probability values for argon used for mapping open and closed inductively coupled plasmas. in P Fauchais (uitgave), Progress in Plasma Processing of Materials 1997, Proceedings of the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996. Begell House Inc., New York, blz. 229-237, conference; Progress in Plasma Processing of Materials 1997 : the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996, 1/01/97.

New transition probability values for argon used for mapping open and closed inductively coupled plasmas. / Mullen, van der, J.J.A.M.; Tas, R.D.; Regt, de, J.M. et al.
Progress in Plasma Processing of Materials 1997, Proceedings of the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996. uitgave / P. Fauchais. New York: Begell House Inc., 1997. blz. 229-237.

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

TY - GEN

T1 - New transition probability values for argon used for mapping open and closed inductively coupled plasmas

AU - Mullen, van der, J.J.A.M.

AU - Tas, R.D.

AU - Regt, de, J.M.

AU - Jonkers, J.

PY - 1997

Y1 - 1997

M3 - Conference contribution

SN - 1-56700-093-2

SP - 229

EP - 237

BT - Progress in Plasma Processing of Materials 1997, Proceedings of the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996

A2 - Fauchais, P.

PB - Begell House Inc.

CY - New York

T2 - conference; Progress in Plasma Processing of Materials 1997 : the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996

Y2 - 1 January 1997

ER -

Mullen, van der JJAM, Tas RD, Regt, de JM, Jonkers J. New transition probability values for argon used for mapping open and closed inductively coupled plasmas. In Fauchais P, redacteur, Progress in Plasma Processing of Materials 1997, Proceedings of the 4th International Thermal Plasma Processes Conference, 4th, Athens, July 15-18, 1996. New York: Begell House Inc. 1997. blz. 229-237