New design concepts for the fabrication of nanometric gap structures: electrochemical oxidation of OTS mono- and bilayer structures

T. Druzhinina, S. Höppener, U.S. Schubert

    Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

    5 Citaten (Scopus)

    Samenvatting

    A reliable nanofabrication concept to engineer metallic nanometric gap structures and to incorporate silver nanoparticles within the gaps utilizing a combination of self-assembly strategies and electrochemical oxidation lithography is developed. The approach uses the differences in oxidation kinetics of n-octadecyltrichlorosilane (OTS) monolayer and bilayer structures. The processes are investigated in detail and form the basis for a new nanofabrication process.
    Originele taal-2Engels
    Pagina's (van-tot)852-857
    TijdschriftSmall
    Volume8
    Nummer van het tijdschrift6
    DOI's
    StatusGepubliceerd - 2012

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