Multi-level nanoimprint lithography for large-area thin film transistor backplane manufacturing

Tamer Dogan, Joris de Riet, Thijs Bel, Roy Verbeek, Ilias Katsouras, Eric Meulenkamp, Gerwin Gelinck, Auke Jisk Kronemeijer (Corresponding author)

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

1 Citaat (Scopus)

Samenvatting

Thin film transistors (TFTs) are the basis for current AMOLED display arrays. For next-generation displays, higher resolution and cost-effective manufacturing of panels is adamant. The current benchmark patterning method in the display industry is photolithography. Here, we propose the use of a hybrid approach of nanoimprint lithography and conventional FPD processing for the realization of high-resolution display backplanes. We demonstrate the realization of sub-micron amorphous oxide semiconductor TFTs with multi-level nanoimprint lithography in order to decrease the number of patterning steps in display manufacturing. Top-gate self-aligned a-IGZO TFTs are realized with performance comparable to benchmark photolithography-based TFTs.

Originele taal-2Engels
Pagina's (van-tot)241-244
Aantal pagina's4
TijdschriftJournal of Photopolymer Science and Technology
Volume33
Nummer van het tijdschrift2
DOI's
StatusGepubliceerd - 1 jul 2020

Vingerafdruk Duik in de onderzoeksthema's van 'Multi-level nanoimprint lithography for large-area thin film transistor backplane manufacturing'. Samen vormen ze een unieke vingerafdruk.

  • Citeer dit