Molecular surface structure of poly(3-hexylthiophene) studied by low energy ion scattering

M.W.G. Ponjee; M.A. Reijme; B.M.W. Langeveld-Voss; A.W. Denier van der Gon; H.H. Brongersma

doi:10.1016/S0039-6028(02)01508-X

Molecular surface structure of poly(3-hexylthiophene) studied by low energy ion scattering

M.W.G. Ponjee, M.A. Reijme, B.M.W. Langeveld-Voss, A.W. Denier van der Gon, H.H. Brongersma

Macromolecular and Organic Chemistry

Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review

7 Citaten (Scopus)

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Low energy ion scattering and X-ray photoelectron spectroscopy were used to study the surface of thin spin-coated poly(3-hexylthiophene) (P3HT) films on silica. We found that the composition of the outermost surface differs from that of the bulk due to the surface molecular structure: the sulphur atoms are screened from being at the outermost surface, presumably by the hexyl side-chains. The influence of this intramolecular segregation phenomenon on the composition is limited to the outermost surface. Comparison of the sputter-profile of P3HT with that taken on a polycrystalline a-quaterthiophene film shows that after sputtering the sulphur to carbon atomic ratio of bulk P3HT is observed.

Originele taal-2	Engels
Pagina's (van-tot)	194-200
Tijdschrift	Surface Science
Volume	512
Nummer van het tijdschrift	3
DOI's	https://doi.org/10.1016/S0039-6028(02)01508-X
Status	Gepubliceerd - 2002

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@article{7248a581e37e4fff8ebb33f5dea091ea,

title = "Molecular surface structure of poly(3-hexylthiophene) studied by low energy ion scattering",

abstract = "Low energy ion scattering and X-ray photoelectron spectroscopy were used to study the surface of thin spin-coated poly(3-hexylthiophene) (P3HT) films on silica. We found that the composition of the outermost surface differs from that of the bulk due to the surface molecular structure: the sulphur atoms are screened from being at the outermost surface, presumably by the hexyl side-chains. The influence of this intramolecular segregation phenomenon on the composition is limited to the outermost surface. Comparison of the sputter-profile of P3HT with that taken on a polycrystalline a-quaterthiophene film shows that after sputtering the sulphur to carbon atomic ratio of bulk P3HT is observed.",

author = "M.W.G. Ponjee and M.A. Reijme and B.M.W. Langeveld-Voss and \{Denier van der Gon\}, A.W. and H.H. Brongersma",

year = "2002",

doi = "10.1016/S0039-6028(02)01508-X",

language = "English",

volume = "512",

pages = "194--200",

journal = "Surface Science",

issn = "0039-6028",

publisher = "Elsevier B.V.",

number = "3",

}

TY - JOUR

T1 - Molecular surface structure of poly(3-hexylthiophene) studied by low energy ion scattering

AU - Ponjee, M.W.G.

AU - Reijme, M.A.

AU - Langeveld-Voss, B.M.W.

AU - Denier van der Gon, A.W.

AU - Brongersma, H.H.

PY - 2002

Y1 - 2002

N2 - Low energy ion scattering and X-ray photoelectron spectroscopy were used to study the surface of thin spin-coated poly(3-hexylthiophene) (P3HT) films on silica. We found that the composition of the outermost surface differs from that of the bulk due to the surface molecular structure: the sulphur atoms are screened from being at the outermost surface, presumably by the hexyl side-chains. The influence of this intramolecular segregation phenomenon on the composition is limited to the outermost surface. Comparison of the sputter-profile of P3HT with that taken on a polycrystalline a-quaterthiophene film shows that after sputtering the sulphur to carbon atomic ratio of bulk P3HT is observed.

AB - Low energy ion scattering and X-ray photoelectron spectroscopy were used to study the surface of thin spin-coated poly(3-hexylthiophene) (P3HT) films on silica. We found that the composition of the outermost surface differs from that of the bulk due to the surface molecular structure: the sulphur atoms are screened from being at the outermost surface, presumably by the hexyl side-chains. The influence of this intramolecular segregation phenomenon on the composition is limited to the outermost surface. Comparison of the sputter-profile of P3HT with that taken on a polycrystalline a-quaterthiophene film shows that after sputtering the sulphur to carbon atomic ratio of bulk P3HT is observed.

U2 - 10.1016/S0039-6028(02)01508-X

DO - 10.1016/S0039-6028(02)01508-X

M3 - Article

SN - 0039-6028

VL - 512

SP - 194

EP - 200

JO - Surface Science

JF - Surface Science

IS - 3

ER -

Molecular surface structure of poly(3-hexylthiophene) studied by low energy ion scattering

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