Molecular simulation strategy for mechanical modeling of amorphous/porous low-dielectric constant materials

C.A. Yuan, O. Sluis, van der, G.Q. Zhang, L.J. Ernst, W.D. Driel, van, A.E. Flower, R.B.R. Silfhout, van

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

13 Citaten (Scopus)
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Samenvatting

We propose an amorphous/porous molecular connection network generation algorithm for simulating the material stiffness of a low-k material (SiOC:H). Based on a given concentration of the basic building blocks, this algorithm will generate an approximate and large amorphous network. The molecular topology is obtained by distributing these blocks randomly into a predefinedframework. Subsequently, a structural relaxation step including local and global perturbations is applied to achieve the most likely stereochemical structure. Thus, the obtained mechanical properties of the low-k materials have been verified with the experimental data.
Originele taal-2Engels
Artikelnummer061909
Pagina's (van-tot)061909-1/3
Aantal pagina's3
TijdschriftApplied Physics Letters
Volume92
Nummer van het tijdschrift6
DOI's
StatusGepubliceerd - 2008

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